Growth and use of metal nanocrystal assemblies on high-density silicon nanowires formed by chemical vapor deposition

Author： Yasseri A.A.   Sharma S.   Kamins T.I.   Li Z.   Stanley Williams R.  

Publisher： Springer Publishing Company

ISSN： 0947-8396

Source： Applied Physics A, Vol.82, Iss.4, 2006-03, pp. : 659-664

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Effect of hydrogen dilution on the growth of nanocrystalline silicon films at high temperature by using plasma-enhanced chemical vapor deposition

By Ali A.M.   Hasegawa S.  

Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 68-73

Elsevier

Access to resources Recommend Favorite

Diamond growth on porous silicon by hot-filament chemical vapor deposition

By Liu Z.   Zong B.Q.   Lin Z.  

Thin Solid Films, Vol. 254, Iss. 1, 1995-01 ,pp. : 3-6

Elsevier

Access to resources Recommend Favorite

Growth mechanisms of silicon films produced by laser-induced chemical vapor deposition

By Tamir S.   Zahavi J.   Komem Y.   Eizenberg M.  

Thin Solid Films, Vol. 261, Iss. 1, 1995-06 ,pp. : 251-255

Elsevier

Access to resources Recommend Favorite

The high-density microwave plasma for high rate deposition of microcrystalline silicon

By Shirai H.   Sakuma Y.   Ueyama H.  

Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. : 7-11

Elsevier

Access to resources Recommend Favorite

High performance amorphous-silicon thin film transistors prepared by catalytic chemical vapor deposition with high deposition rate

By Sakai M.   Tsutsumi T.   Yoshioka T.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 330-334

Elsevier

Access to resources Recommend Favorite