Effect of processing parameters on the deposition rate of Si3N4/Si2N2O by chemical vapor infiltration and the in situ thermal decomposition of Na2SiF6

Author： Pech-Canul M.I.   de la Peña J.L.   Leal-Cruz A.L.  

Publisher： Springer Publishing Company

ISSN： 0947-8396

Source： Applied Physics A, Vol.89, Iss.3, 2007-11, pp. : 729-735

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