Patterning of Polymer Arrays with Enhanced Aspect-Ratio Using Hybrid Substrate Conformal Imprint Lithography

Publisher: Trans Tech Publications

E-ISSN: 1662-8985|2015|1119|179-183

ISSN: 1022-6680

Source: Advanced Materials Research, Vol.2015, Iss.1119, 2015-08, pp. : 179-183

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract