Study on the Key Parameters in Etching of Fused Silica Using Atmospheric Inductively Coupled Plasma

Publisher： Trans Tech Publications

E-ISSN： 1662-9795|2014|625|469-474

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2014, Iss.625, 2014-10, pp. : 469-474

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Characterizations of Removal Rate and Temperature in the Inductively Coupled Plasma Etching of Silicon Carbide

By  

Key Engineering Materials, Vol. 2016, Iss. 679, 2016-03 ,pp. : 85-90

Trans Tech Publications

Access to resources Recommend Favorite

Deep Wet Etching Uniformity of Polished Fused Silica Glass

By  

Key Engineering Materials, Vol. 2017, Iss. 726, 2017-03 ,pp. : 404-408

Trans Tech Publications

Access to resources Recommend Favorite

The study of FTO surface texturing fabrication using Argon plasma etching technique for DSSC applications

By  

IOP Conference Series: Materials Science and Engineering, Vol. 107, Iss. 1, 2016-02 ,pp. : 208-211

IOP Publishing

Access to resources Recommend Favorite

Mineral/melt partition coefficients of oceanic alkali basalts determined on natural samples using laser ablation-inductively coupled plasma-mass spectrometry (LAM-ICP-MS)

By Thompson G.M.   Malpas J.  

Mineralogical Magazine, Vol. 64, Iss. 1, 2000-02 ,pp. : 85-85

Mineralogical Society

Access to resources Recommend Favorite

Study of Wetting of Nanostructures Using Decoration by Etching

By  

Solid State Phenomena, Vol. 2014, Iss. 219, 2014-01 ,pp. : 111-114

Trans Tech Publications

Access to resources Recommend Favorite