Publisher: John Wiley & Sons Inc
E-ISSN: 1097-4555|46|12|1200-1204
ISSN: 0377-0486
Source: JOURNAL OF RAMAN SPECTROSCOPY, Vol.46, Iss.12, 2015-12, pp. : 1200-1204
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Atomic layer deposition (ALD): from precursors to thin film structures
Thin Solid Films, Vol. 409, Iss. 1, 2002-04 ,pp. :
Predictive modeling of atomic layer deposition on the feature scale
By Gobbert M.K. Prasad V. Cale T.S.
Thin Solid Films, Vol. 410, Iss. 1, 2002-05 ,pp. :
Nanoscale Structuring of Surfaces by Using Atomic Layer Deposition
ANGEWANDTE CHEMIE INTERNATIONAL EDITION, Vol. 54, Iss. 50, 2015-12 ,pp. :
Indium‐Free Fully Transparent Electronics Deposited Entirely by Atomic Layer Deposition
ADVANCED MATERIALS, Vol. 28, Iss. 35, 2016-09 ,pp. :