Removal of Interfacial Layer in HfO2 Gate Stack by Post-Gate Cleaning Using NF3/NH3 Dry Cleaning Technique

Publisher： Trans Tech Publications

E-ISSN： 1662-9779|2014|219|11-15

ISSN： 1012-0394

Source： Solid State Phenomena, Vol.2014, Iss.219, 2014-01, pp. : 11-15

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