Polycrystalline silicon thin films on glass deposited from chlorosilane at intermediate temperatures

Author： Benvenuto A. G. Buitrago R. H. Schmidt J. A.

E-ISSN： 1286-0050|58|2|20101-20101

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.58, Iss.2, 2012-05, pp. : 20101-20101

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