Ion flux-film structure relationship during magnetron sputtering of WO3

Author: Hemberg A.   Konstantinidis S.   Renaux F.   Dauchot J.P.   Snyders R.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|56|2|24016-24016

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.56, Iss.2, 2011-10, pp. : 24016-24016

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Abstract