AlN thin films deposited by DC reactive magnetron sputtering: effect of oxygen on film growth

By García Molleja Javier   Gómez Bernardo José   Ferrón Julio   Gautron Eric   Bürgi Juan   Abdallah Bassam   Djouadi Mohamed Abdou   Feugeas Jorge   Jouan Pierre-Yves  

EPJ Applied Physics (The), Vol. 64, Iss. 2, 2013-11 ,pp. : 20302-20302

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() preferential orientation of polycrystalline AlN grown on SiO₂/Si wafers by reactive sputter magnetron technique

By Bürgi Juan   Molleja Javier García   Bolmaro Raúl   Piccoli Mattia   Bemporad Edoardo   Craievich Aldo   Feugeas Jorge  

EPJ Applied Physics (The), Vol. 74, Iss. 1, 2016-04 ,pp. : 10301-10301

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Luminescence from thulium and samarium doped amorphous AlN thin films deposited by RF magnetron sputtering and the effect of thermal activation on luminescence

By Maqbool M.  

EPJ Applied Physics (The), Vol. 34, Iss. 1, 2006-03 ,pp. : 31-34

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Rapid thermal annealing of sputter-deposited ZnO:Al films for microcrystalline Si thin-film solar cells

By Koshino H.   Tang Z.   Sato S.   Shimizu H.   Fujii Y.   Hanajiri T.   Shirai H.  

EPJ Photovoltaics, Vol. 3, Iss. issue, 2012-06 ,pp. : 35001-35001

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Effects of substrates on the crystal structure, texturing and optical properties of AlN coatings deposited by inverted cylindrical magnetron sputtering

By Khanna A.   Bhat D.G.  

EPJ Applied Physics (The), Vol. 59, Iss. 3, 2012-10 ,pp. : 30301-30301

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