() preferential orientation of polycrystalline AlN grown on SiO₂/Si wafers by reactive sputter magnetron technique

Author： Bürgi Juan Molleja Javier García Bolmaro Raúl Piccoli Mattia Bemporad Edoardo Craievich Aldo Feugeas Jorge

E-ISSN： 1286-0050|74|1|10301-10301

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.74, Iss.1, 2016-04, pp. : 10301-10301

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