Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering

Author: Duarte D. A.   Massi M.   da Silva Sobrinho A. S.   Maciel H. S.   Grigorov K.   Fontana L. C.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|49|1|13107-13107

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.49, Iss.1, 2010-01, pp. : 13107-13107

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