Atomic scale study of InP etching by Cl₂-Ar ICP plasma discharge

Author： Rhallabi A. Chanson R. Landesman J.-P. Cardinaud C. Fernandez M.-C.

E-ISSN： 1286-0050|53|3|33606-33606

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.53, Iss.3, 2011-02, pp. : 33606-33606

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