Simulation of Chemical Vapour Deposition of SiC from Methyltrichlorosilane in a Hot Wall Reactor

Publisher： Edp Sciences

E-ISSN： 1764-7177|05|C5|C5-253-C5-260

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.05, Iss.C5, 1995-06, pp. : C5-253-C5-260

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