Publisher: Edp Sciences
E-ISSN: 1764-7177|03|C3|C3-209-C3-215
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.03, Iss.C3, 1993-08, pp. : C3-209-C3-215
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Atmospheric pressure chemical vapour deposition of tin sulfide thin films
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
Laser-Induced Chemical Vapour Deposition of Silicon Carbonitride
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :
Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
Atmospheric pressure chemical vapour deposition of chromium oxide films
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :