Atmospheric pressure chemical vapour deposition of chromium oxide films

Publisher： Edp Sciences

E-ISSN： 1764-7177|09|PR8|Pr8-387-Pr8-393

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.09, Iss.PR8, 1999-09, pp. : Pr8-387-Pr8-393

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Atmospheric pressure chemical vapour deposition of tin sulfide thin films

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-403-Pr8-410

Edp Sciences

Access to resources Recommend Favorite

The Atmospheric Pressure Plasma Chemical Vapour Deposition – APCVD

By  

Journal of Magnetohydrodynamics, Plasma, and Space Research, Vol. , Iss. , 2016-01 ,pp. : 50-56

Nova Science Publishers, Inc.

Access to resources Recommend Favorite

Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, O3, TMB, TMPi : Determination of a chemical mechanism

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-149-Pr3-154

Edp Sciences

Access to resources Recommend Favorite

Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, 0$_3$, TMB, TMP$_I$: Determination of a chemical mechanism

By  

Le Journal de Physique IV, Vol. 12, Iss. 4, 2002-06 ,pp. : 37-44

Edp Sciences

Access to resources Recommend Favorite

Laser induced chemical vapour deposition of TiN coatings at atmospheric pressure

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-209-C3-215

Edp Sciences

Access to resources Recommend Favorite