Publisher: Edp Sciences
E-ISSN: 1764-7177|03|C3|C3-171-C3-176
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.03, Iss.C3, 1993-08, pp. : C3-171-C3-176
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Characterization of SiO
Le Journal de Physique IV, Vol. 03, Iss. C4, 1993-09 ,pp. :
Low-temperature deposition of ultrathin SiO2 films on Si substrates
Journal of Physics: Conference Series , Vol. 514, Iss. 1, 2014-05 ,pp. :