DOWNSTREAM MICROWAVE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION OF SiO2 USING O2/SiH4 AND N2O/SiH4 MIXTURES

Publisher： Edp Sciences

E-ISSN： 1764-7177|02|C2|C2-421-C2-428

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.02, Iss.C2, 1991-09, pp. : C2-421-C2-428

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