Growth kinetics of copper thin films in different MOCVD systems

Publisher： Edp Sciences

E-ISSN： 1764-7177|03|C3|C3-345-C3-352

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.03, Iss.C3, 1993-08, pp. : C3-345-C3-352

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Growth mechanisms of MOCVD processed Ni thin films

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-57-Pr8-64

Edp Sciences

Access to resources Recommend Favorite

MOCVD of ferroelectric thin films

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-575-Pr8-582

Edp Sciences

Access to resources Recommend Favorite

MOCVD of Ag thin films

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-645-Pr3-652

Edp Sciences

Access to resources Recommend Favorite

Kinetics of the melting-dispersion process in copper thin films

By Gromov D.   Gavrilov S.   Redichev E.   Ammosov R.  

Physics of the Solid State, Vol. 49, Iss. 1, 2007-01 ,pp. : 178-184

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-1147-Pr3-1152

Edp Sciences

Access to resources Recommend Favorite