Related content

Kinetic Processes in the CVD of SiC from CH3SiCl3-H2 in a Vertical Hot-Wall Reactor

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-105-C5-112

Edp Sciences

Access to resources Recommend Favorite

ON THE KINETICS OF THE CVD OF Si FROM SiH2Cl2/H2 AND SiC FROM CH3SiCl3/H2 IN A VERTICAL TUBULAR HOT-WALL REACTOR

By  

Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. : C5-93-C5-103

Edp Sciences

Access to resources Recommend Favorite

KINETICS OF THE CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE-FROM Si(CH3)4/ NH3/H2 GAS MIXTURES

By  

Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. : C5-435-C5-444

Edp Sciences

Access to resources Recommend Favorite

SiCN Amorphous Materials Chemical Vapour Deposited Using the Si(CH3)4-NH3-H2 System

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-793-C5-800

Edp Sciences

Access to resources Recommend Favorite

Reactive scattering of alkali dimers : K 2 +SnCl 4 , CCl 4 , SiCl 4 , PBr 3 , PCl 3 , BBr 3 , CH 2 Br 2

By Foreman P.B.   Kendall G.M.   Grice R.  

Molecular Physics, Vol. 25, Iss. 3, 1973-03 ,pp. : 529-549

Taylor & Francis Ltd

Access to resources Recommend Favorite