Publisher: Edp Sciences
E-ISSN: 1764-7177|03|C3|C3-261-C3-264
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.03, Iss.C3, 1993-08, pp. : C3-261-C3-264
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
MOCVD AND PLASMA MOCVD OF METAL OXIDE FILMS
Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. :
Growth studies of laser-induced CVD diamond films
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :
In-situ process monitoring of MOCVD of superconducting and dielectric oxide thin films
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
MOCVD of aluminium oxide films using aluminium
Le Journal de Physique IV, Vol. 12, Iss. 4, 2002-06 ,pp. :