Publisher: Edp Sciences
E-ISSN: 1764-7177|05|C5|C5-79-C5-86
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.05, Iss.C5, 1995-06, pp. : C5-79-C5-86
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Metalorganic Chemical Vapor Deposition of Lanthanum Aluminate Thin Films for Gate Dielectrics
By Li A.
Ferroelectrics, Vol. 329, Iss. 1, 2005-01 ,pp. :
HIGH Tc SUPERCONDUCTING THIN FILMS BY ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION
Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. :
Chemical vapor deposition of hafnium carbide and hafnium nitride
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :