Chemical Vapour Deposition of AIN-Si3N4 Codeposits

Publisher： Edp Sciences

E-ISSN： 1764-7177|05|C5|C5-785-C5-792

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.05, Iss.C5, 1995-06, pp. : C5-785-C5-792

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Transmission Electron Microscopy Studies of (AIN-Si3N4) Codeposits Obtained by LPCVD

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-905-C5-912

Edp Sciences

Access to resources Recommend Favorite

A study of AlN-Si3N4 codeposits using the L.P.C.V.D. technique

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-519-C3-526

Edp Sciences

Access to resources Recommend Favorite

DOWNSTREAM MICROWAVE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION OF SiO2 USING O2/SiH4 AND N2O/SiH4 MIXTURES

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-421-C2-428

Edp Sciences

Access to resources Recommend Favorite

PROTECTION AGAINST OXIDATION OF C/SiC COMPOSITES BY CHEMICAL VAPOUR DEPOSITION OF TITANIUM DIBORIDE : DEPOSITION KINETICS AND OXIDATION BEHAVIOUR OF FILMS PREPARED FROM TiCl4/BCl3/H2 MIXTURES

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-657-C2-664

Edp Sciences

Access to resources Recommend Favorite

CHEMICAL VAPOUR DEPOSITION OF THE Al-O-N SYSTEM

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-665-C2-672

Edp Sciences

Access to resources Recommend Favorite