Publisher: Edp Sciences
E-ISSN: 1764-7177|11|PR3|Pr3-747-Pr3-753
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.11, Iss.PR3, 2001-08, pp. : Pr3-747-Pr3-753
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
By Ren Dasen Cui Xiaoli Shen Jie Zhang Qun Yang Xiliang Zhang Zhuangjian Ming Lu
Journal of Sol-Gel Science and Technology, Vol. 29, Iss. 3, 2004-03 ,pp. :
CHARACTERIZATION OF SiO
Le Journal de Physique Colloques, Vol. 49, Iss. C4, 1988-09 ,pp. :
Low-temperature deposition of ultrathin SiO2 films on Si substrates
Journal of Physics: Conference Series , Vol. 514, Iss. 1, 2014-05 ,pp. :