REACTION KINETICS OF MoSi2 SILICIDE OBTAINED BY cw LASER ANNEALING OF Si (a) AND Sipoly/Mo BILAYERS

Publisher: Edp Sciences

E-ISSN: 0449-1947|44|C5|C5-455-C5-460

ISSN: 0449-1947

Source: Le Journal de Physique Colloques, Vol.44, Iss.C5, 1983-10, pp. : C5-455-C5-460

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