MIGRATION OF FLUORINE ATOMS AND INFLUENCE ON SHALLOW P+N JUNCTION IN B+2 IMPLANTED SILICON UNDER RTA

Publisher: Edp Sciences

E-ISSN: 0449-1947|49|C4|C4-519-C4-522

ISSN: 0449-1947

Source: Le Journal de Physique Colloques, Vol.49, Iss.C4, 1988-09, pp. : C4-519-C4-522

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