Ultimate Scaling of High-κ Gate Dielectrics: Higher-κ or Interfacial Layer Scavenging?

Author: Ando Takashi  

Publisher: MDPI

E-ISSN: 1996-1944|5|3|478-500

ISSN: 1996-1944

Source: Materials, Vol.5, Iss.3, 2012-03, pp. : 478-500

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Abstract