Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

Author: Wang Changtao   Zhang Wei   Zhao Zeyu   Wang Yanqin   Gao Ping   Luo Yunfei   Luo Xiangang  

Publisher: MDPI

E-ISSN: 2072-666x|7|7|118-118

ISSN: 2072-666x

Source: Micromachines, Vol.7, Iss.7, 2016-07, pp. : 118-118

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Abstract