Effect of Deposition Time on Structure of TiAlN Thin Films Deposited by Reactive DC Magnetron Co-Sputtering

E-ISSN： 1662-7482|2017|866|318-321

ISSN： 1660-9336

Source： Applied Mechanics and Materials, Vol.2017, Iss.866, 2017-07, pp. : 318-321

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