Effect of Al Sputtering Current on Structure of CrAlN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering

Publisher: Trans Tech Publications

E-ISSN: 1662-7482|2017|866|322-325

ISSN: 1660-9336

Source: Applied Mechanics and Materials, Vol.2017, Iss.866, 2017-07, pp. : 322-325

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract