Growth of 150 mm 4H-SiC Epitaxial Layer by a Hot-Wall Reactor

Publisher： Trans Tech Publications

E-ISSN： 1662-9752|2018|924|76-79

ISSN： 0255-5476

Source： Materials Science Forum, Vol.2018, Iss.924, 2018-07, pp. : 76-79

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Abstract

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