The Role of III-V Substrate Roughness and Deoxidation Induced by Digital Etch in Achieving Low Resistance Metal Contacts

Author: Ravaux Florent   Saadat Irfan   Jouiad Mustapha  

Publisher: MDPI

E-ISSN: 2073-4352|7|6|177-177

ISSN: 2073-4352

Source: Crystals, Vol.7, Iss.6, 2017-06, pp. : 177-177

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Abstract