Radio-frequency capacitively coupled plasmas in hydrogen excited by tailored voltage waveforms: comparison of simulations with experiments

Publisher: IOP Publishing

E-ISSN: 1361-6595|23|6|65049-65059

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.23, Iss.6, 2014-12, pp. : 65049-65059

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content