Study of Etchants’ Diffusion into a 248 nm Deep UV Photoresist during a Wet Etch

Publisher: Trans Tech Publications

E-ISSN: 1662-9779|2014|219|183-186

ISSN: 1012-0394

Source: Solid State Phenomena, Vol.2014, Iss.219, 2014-01, pp. : 183-186

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Abstract