Synthesis of a branched photosensitive copolymer and its application for negative‐type photoresists

Publisher: John Wiley & Sons Inc

E-ISSN: 1097-4628|133|3|n/a-n/a

ISSN: 0021-8995

Source: JOURNAL OF APPLIED POLYMER SCIENCE, Vol.133, Iss.3, 2016-01, pp. : n/a-n/a

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