Photolithography with polymethyl methacrylate (PMMA)

Author: Carbaugh Daniel J   Wright Jason T   Parthiban Rajan   Rahman Faiz  

Publisher: IOP Publishing

E-ISSN: 1361-6641|31|2|25010-25019

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.31, Iss.2, 2016-02, pp. : 25010-25019

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract