PEN Film Surface Development Using High-Frequency - Low Pressure Plasma Chemical Vapor Deposition System

Publisher: Trans Tech Publications

E-ISSN: 1662-7482|2014|704|58-62

ISSN: 1660-9336

Source: Applied Mechanics and Materials, Vol.2014, Iss.704, 2015-02, pp. : 58-62

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract