Impact of LPCVD TEOS Thickness on Vt-Pushout in Flash Memory Cell due to Mechanical Stress

Publisher: Trans Tech Publications

E-ISSN: 1662-9795|2016|701|73-76

ISSN: 1013-9826

Source: Key Engineering Materials, Vol.2016, Iss.701, 2016-08, pp. : 73-76

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Abstract