Structural Changes of Titanium Dioxide Thin Films Deposited by Reactive Magnetron Sputtering through Nitrogen Incorporation

Publisher： Trans Tech Publications

E-ISSN： 1662-9795|2016|683|383-388

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2016, Iss.683, 2016-03, pp. : 383-388

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Structural, electrical and optical characteristics of Al-doped zinc oxide thin films deposited by reactive magnetron sputtering

By  

IOP Conference Series: Materials Science and Engineering, Vol. 49, Iss. 1, 2013-12 ,pp. : 234-237

IOP Publishing

Access to resources Recommend Favorite

Nanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering

By  

IOP Conference Series: Materials Science and Engineering, Vol. 64, Iss. 1, 2014-08 ,pp. : 149-154

IOP Publishing

Access to resources Recommend Favorite

Investigation of CaTiO3:Pr3+ thin films deposited by radiofrequency reactive magnetron sputtering for electroluminescence application

By  

IOP Conference Series: Materials Science and Engineering, Vol. 12, Iss. 1, 2010-06 ,pp. : 33-37

IOP Publishing

Access to resources Recommend Favorite

Fabrication and Characterization of Antibacterial Tantalum Oxide Thin Films Deposited by Reactive Magnetron Sputtering

By  

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 185-188

Trans Tech Publications

Access to resources Recommend Favorite

Materials properties of nanostructured titanium nitride thin films synthesised by DC reactive magnetron sputtering

By Subramanian B.   Jayachandran M.  

Transactions of the Institute of Metal Finishing, Vol. 86, Iss. 1, 2008-01 ,pp. : 62-65

Maney Publishing

Access to resources Recommend Favorite