Materials properties of nanostructured titanium nitride thin films synthesised by DC reactive magnetron sputtering

Author： Subramanian B.   Jayachandran M.  

Publisher： Maney Publishing

ISSN： 0020-2967

Source： Transactions of the Institute of Metal Finishing, Vol.86, Iss.1, 2008-01, pp. : 62-65

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Nanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering

By  

IOP Conference Series: Materials Science and Engineering, Vol. 64, Iss. 1, 2014-08 ,pp. : 149-154

IOP Publishing

Access to resources Recommend Favorite

The Influence of N2 Partial Pressure on Color, Mechanical, and Corrosion Properties of TiN Thin Films Deposited by DC Reactive Magnetron Sputtering

By  

Key Engineering Materials, Vol. 2015, Iss. 659, 2015-09 ,pp. : 550-554

Trans Tech Publications

Access to resources Recommend Favorite

Effect of Ti Sputtering Current on Structure of TiCrN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering

By  

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 181-184

Trans Tech Publications

Access to resources Recommend Favorite

Fabrication of Aluminum Nitride Films by Reactive Pulse DC Magnetron Sputtering for Vibration Energy Harvester

By  

Key Engineering Materials, Vol. 2015, Iss. 645, 2015-06 ,pp. : 1133-1138

Trans Tech Publications

Access to resources Recommend Favorite

Surface metallic state of aluminum-nitride (AlN) thin films prepared by direct current (DC)-reactive magnetron sputtering: optical spectroscopic analysis with incoherent light

By Rakov N.   Mahmood A.   Xiao M.  

Scripta Materialia, Vol. 50, Iss. 5, 2004-03 ,pp. : 589-592

Elsevier

Access to resources Recommend Favorite