Diffusion and Electrical Activation After a Rapid Thermal Annealing of an As and B-Co-Implanted Polysilicon Layer

E-ISSN： 1286-4897|7|1|47-58

ISSN： 1155-4320

Source： Journal de Physique III, Vol.7, Iss.1, 1997-01, pp. : 47-58

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