Mechanisms and rate determining steps in plasma induced high rate CVD of silicon an germanium: similarities and differences

Publisher： Edp Sciences

E-ISSN： 1286-4897|2|8|1431-1438

ISSN： 1155-4320

Source： Journal de Physique III, Vol.2, Iss.8, 1992-08, pp. : 1431-1438

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