Publisher: Edp Sciences
E-ISSN: 1286-4897|5|8|1145-1160
ISSN: 1155-4320
Source: Journal de Physique III, Vol.5, Iss.8, 1995-08, pp. : 1145-1160
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Thermochemical and Mass Transport Modelling of the Chemical Vapour Deposition of Si
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :
Hafnium carbide as a barrier in multilayer coatings by chemical vapor deposition (CVD)
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
2D MODELLING OF SILICON CHEMICAL VAPOR DEPOSITION IN AN IMPINGING JET REACTOR
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :