Author: Qi Zeming Cheng Xuerui Zhang Guobin Li Tingting Wang Yuyin Shao Tao Li Chengxiang He Bo
Publisher: Edp Sciences
E-ISSN: 1286-4854|97|5|57008-57008
ISSN: 0295-5075
Source: EPL (EUROPHYSICS LETTERS), Vol.97, Iss.5, 2012-03, pp. : 57008-57008
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
HfO2-TiO2 Ultra-Thin Gate Dielectric by RF Sputtering
By Li G. X. Chen X. F. Ren W. Shi P. Wu X. Q. Tan O. K. Zhu W. G. Yao X.
Ferroelectrics, Vol. 410, Iss. 1, 2011-01 ,pp. :