Development of Self‐Heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals

Publisher: John Wiley & Sons Inc

E-ISSN: 1520-6440|101|3|96-102

ISSN: 1942-9533

Source: ELECTRONICS & COMMUNICATIONS IN JAPAN, Vol.101, Iss.3, 2018-03, pp. : 96-102

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Abstract