Influence of dopant concentration and type of substrate on the local organization of low-pressure chemical vapour deposition in situ boron doped silicon films from silane and boron trichloride

Author： Caussat B.   Scheid E.   de Mauduit B.   Berjoan R.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.446, Iss.2, 2004-01, pp. : 218-226

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