Suppression of interfacial diffusion by a predeposited Hf metal layer on SiO 2 /Si

Author: Tan R.   Azuma Y.   Kojima I.  

Publisher: Elsevier

ISSN: 0169-4332

Source: Applied Surface Science, Vol.222, Iss.1, 2004-01, pp. : 346-350

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Abstract