Applied Surface Science,volume 222,issue 1  (01-2004)

Period of time: 2004年1期

Publisher: Elsevier

Founded in: 1978

Total resources: 2

ISSN: 0169-4332

Subject: Q4 Physiology

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Applied Surface Science,volume 222,issue 1

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Light-stimulated switching of azobenzene-containing self-assembled monolayers

By Hamelmann F., Heinzmann U., Siemeling U., Bretthauer F., Vor der Bruggen J. in (2004)

Applied Surface Science,volume 222,issue 1 , Vol. 222, Iss. 1, 2004-01 , pp. 1-5

Elsevier

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Noble gas ion effects on the XPS valence band spectra of silicon

By Walker E., Lund C.P., Jennings P., Cornish J.C.L., Klauber C., Hefter G. in (2004)

Applied Surface Science,volume 222,issue 1 , Vol. 222, Iss. 1, 2004-01 , pp. 13-16

Elsevier

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A study of the surface structure and composition of annealed Ga 0.96 Mn 0.04 As(1 0 0)

By Mikkelsen A., Gustafson J., Sadowski J., Andersen J.N., Kanski J., Lundgren E. in (2004)

Applied Surface Science,volume 222,issue 1 , Vol. 222, Iss. 1, 2004-01 , pp. 23-32

Elsevier

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BCl 3 /Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor

By Lim W.T., Baek I.K., Lee J.W., Lee E.S., Jeon M.H., Cho G.S., Pearton S.J. in (2004)

Applied Surface Science,volume 222,issue 1 , Vol. 222, Iss. 1, 2004-01 , pp. 74-81

Elsevier

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