Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry

Author: Hellin D.   Bearda T.   Zhao C.   Raskin G.   Mertens P.W.   De Gendt S.   Heyns M.M.   Vinckier C.  

Publisher: Elsevier

ISSN: 0584-8547

Source: Spectrochimica Acta Part B: Atomic Spectroscopy, Vol.58, Iss.12, 2003-12, pp. : 2093-2104

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