Superconducting flux flow transistor fabricated by an inductively coupled plasma etching technique

Author： Kang H.-G.   Im Y.-H.   Ko S.   Lim S.-H.   Han B.-S.   Hahn Y.B.  

Publisher： Elsevier

ISSN： 0921-4534

Source： Physica C, Vol.400, Iss.3, 2004-01, pp. : 111-116

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