In situ boron-doped LPCVD polysilicon with low tensile stress for MEMS applications

Author: Ylonen M.   Torkkeli A.   Kattelus H.  

Publisher: Elsevier

ISSN: 0924-4247

Source: Sensors and Actuators A: Physical, Vol.109, Iss.1, 2003-12, pp. : 79-87

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